Facility Updates

MLA-150 maskless aligner—final stages of installation

The new MLA-150 maskless aligner is being qualified by Heidelberg engineers during the final stages of the installation! The tool represents a key element of Fab.nano’s optical lithography capabilities.

MLA-150 is unpacked and moved into the cleanroom

The new MLA-150, a direct-write laser system that can expose UV sensitive photoresist on wafers or masks, has arrived at MIT.nano and we unpacked it today! See the whole process in this nine-image photo story.

MLA-150 arrives at MIT.nano

The new MLA-150 for MIT.nano's cleanroom has arrived by air freight. Installation will be in progress throughout the month of January. The tool will be located on the first floor.

Exploring the fan deck infrastructure

Three undergraduate students in course 3.155J/6.152J went on one of the in-depth small tours of MIT.nano, exploring the infrastructure to see what makes the lab run.