The new MLA-150 maskless aligner is being qualified by Heidelberg engineers during the final stages of the installation! The tool represents a key element of Fab.nano’s optical lithography capabilities.
The new MLA-150, a direct-write laser system that can expose UV sensitive photoresist on wafers or masks, has arrived at MIT.nano and we unpacked it today! See the whole process in this nine-image photo story.
The new MLA-150 for MIT.nano's cleanroom has arrived by air freight. Installation will be in progress throughout the month of January. The tool will be located on the first floor.
Three undergraduate students in course 3.155J/6.152J went on one of the in-depth small tours of MIT.nano, exploring the infrastructure to see what makes the lab run.
The first tests of the fluidic device designed and fabricated by 6.152J students on the new fluidic test station that was installed yesterday in the soft litho cleanroom at MIT.nano.